Low-pressure inductively coupled plasma etching of...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2012 Vol. 30; Iss. 6

Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry

Douglas, Erica A., Stevens, Jeffrey, Fishgrab, Kira, Ford, Christine, Shul, Randy J., Pearton, Stephen J.
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Volume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4758765
File:
PDF, 1.27 MB
english, 2012
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