Comparison of the effects of downstream H2- and O2-based...

Comparison of the effects of downstream H2- and O2-based plasmas on the removal of photoresist, silicon, and silicon nitride

Thedjoisworo, Bayu, Cheung, David, Crist, Vince
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4792254
File:
PDF, 971 KB
english, 2013
Conversion to is in progress
Conversion to is failed