Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO 4 -precursor and H 2 -plasma
Minjauw, Matthias M., Dendooven, Jolien, Capon, Boris, Schaekers, Marc, Detavernier, ChristopheVolume:
3
Year:
2015
Language:
english
Journal:
J. Mater. Chem. C
DOI:
10.1039/C5TC00751H
File:
PDF, 2.71 MB
english, 2015