Partially hydrogenated poly(vinyl phenol) based photoresist...

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Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect ratio micromachining

M. Chatzichristidi, I. Raptis, P. Argitis, J. Everett
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Year:
2002
Language:
english
DOI:
10.1116/1.1521741
File:
PDF, 673 KB
english, 2002
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