Etching characteristics of TiN used as hard mask in...

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Etching characteristics of TiN used as hard mask in dielectric etch process

M. Darnon, T. Chevolleau, D. Eon, L. Vallier, J. Torres, O. Joubert
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Year:
2006
Language:
english
DOI:
10.1116/1.2338048
File:
PDF, 724 KB
english, 2006
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