dc and low frequency noise analysis of Fowler–Nordheim...

  • Main
  • dc and low frequency noise analysis of...

dc and low frequency noise analysis of Fowler–Nordheim stress of n-channel metal-oxide semiconductor field-effect transistors processed in a 65 nm technology

J. Armand, F. Martinez, P. Benoit, M. Valenza, E. Vincent, V. Huard, K. Rochereau
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2009
Language:
english
DOI:
10.1116/1.3130166
File:
PDF, 686 KB
english, 2009
Conversion to is in progress
Conversion to is failed