Study of resolution limits due to intrinsic bias in chemically amplified photoresists
S. V. Postnikov, M. D. Stewart, H. V. Tran, M. A. Nierode, D. R. Medeiros, T. Cao, J. Byers, S. E. Webber, C. G. WilsonYear:
1999
Language:
english
DOI:
10.1116/1.591007
File:
PDF, 548 KB
english, 1999