Global model of a low pressure ECR microwave plasma applied to the PECVD of SiO 2 thin films
Yanguas-Gil, A, Cotrino, J, González-Elipe, A RVolume:
40
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/40/11/023
Date:
June, 2007
File:
PDF, 620 KB
english, 2007