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[IEEE 2000 International Semiconductor Conference. 23rd Edition. CAS 2000 Proceedings - Sinaia, Romania (10-14 Oct. 2000)] 2000 International Semiconductor Conference. 23rd Edition. CAS 2000 Proceedings (Cat. No.00TH8486) - Residual stress analysis in thin membranes obtained by boron diffusion processes
Manea, E., Cernica, I., Dolocan, V., Muller, R.Volume:
2
Year:
2000
Language:
english
DOI:
10.1109/SMICND.2000.889134
File:
PDF, 341 KB
english, 2000