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Triple crystal diffractometry, x-ray standing wave, and transmission electron microscopy investigation of shallow BF[sub 2] implantation in Si
C. Bocchi, F. Germini, G. Ghezzi, E. Gombia, R. Mosca, L. Nasi, E. K. Mukhamedzhanov, V. Privitera, C. SpinellaYear:
2002
Language:
english
DOI:
10.1116/1.1491548
File:
PDF, 862 KB
english, 2002