Effects of SiO[sub 2]∕Si[sub 3]N[sub 4] hard masks on etching properties of metal gates
W. S. Hwang, B. Cho, D. S. H. Chan, V. Bliznetsov, W. J. YooYear:
2006
Language:
english
DOI:
10.1116/1.2382950
File:
PDF, 1.07 MB
english, 2006