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Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope
K. Hamamoto, N. Sakaya, M. Hosoya, M. Kureishi, R. Ohkubo, T. Shoki, O. Nagarekawa, J. Kishimoto, T. Watanabe, H. KinoshitaYear:
2009
Language:
english
DOI:
10.1116/1.3179185
File:
PDF, 1.15 MB
english, 2009