Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2013 Vol. 31; Iss. 6
Accuracy of wafer level alignment with substrate conformal imprint lithography
Fader, Robert, Rommel, Mathias, Bauer, Anton, Rumler, Maximilian, Frey, Lothar, Antonius Verschuuren, Marcus, van de Laar, Robert, Ji, Ran, Schömbs, UlrikeVolume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4824696
File:
PDF, 2.14 MB
english, 2013