Accuracy of wafer level alignment with substrate conformal...

Accuracy of wafer level alignment with substrate conformal imprint lithography

Fader, Robert, Rommel, Mathias, Bauer, Anton, Rumler, Maximilian, Frey, Lothar, Antonius Verschuuren, Marcus, van de Laar, Robert, Ji, Ran, Schömbs, Ulrike
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Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4824696
File:
PDF, 2.14 MB
english, 2013
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