Environmental stability of 193 nm single layer chemically amplified resists
A. G. Timko, F. M. Houlihan, R. A. Cirelli, O. Nalamasu, H. Yoshino, T. Itani, H. Tanabe, K. KasamaYear:
1999
Language:
english
DOI:
10.1116/1.590522
File:
PDF, 1.88 MB
english, 1999