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Hyper NA water immersion lithography at 193 nm and 248 nm
B. W. Smith, Y. Fan, J. Zhou, A. Bourov, L. Zavyalova, N. Lafferty, F. Cropanese, A. EstroffYear:
2004
Language:
english
DOI:
10.1116/1.1825018
File:
PDF, 931 KB
english, 2004