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Transient Rapid Thermal Annealing of Low-Dose High-Energy Phosphorus Implanted Silicon
Bársony, István, Heideman, Jean-Luc, Klappe, Jos, Middelhoek, JanVolume:
30
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.418
Date:
February, 1991
File:
PDF, 759 KB
1991