New Efficient Treatment of Impact Ionization in Submicron...

Japanese Journal of Applied Physics 1992 / 12 Vol. 31; Iss. Part 1, No

New Efficient Treatment of Impact Ionization in Submicron Metal-Oxide-Semiconductor Field-Effect Transistors

Fukuda, Koichi, Peifer, Hermann-Josef, Meinerzhagen, Bernd, Thoma, Rainer, Engl, Walter L.
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Volume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.3763
Date:
December, 1992
File:
PDF, 1.16 MB
1992
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