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Studies of N H 3 Thermal Nitridation of Ultrathin Si-Oxide Films on Si using Photoemission Spectroscopy with Synchrotron Radiation
Yamamoto, Ken-ichi, Nakazawa, MasatoshiVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.285
Date:
January, 1994
File:
PDF, 423 KB
english, 1994