Fine $\bf SiO_{2}$ Pattern Generation by Electron Beam...

Japanese Journal of Applied Physics 1996 / 4 Vol. 35; Iss. Part 2, No

Fine $\bf SiO_{2}$ Pattern Generation by Electron Beam Direct Writing onto Polysiloxene-Based Thin Films and Its Application to Etch Mask

Okamoto, Katsuhiko, Yamakawa, Shinpei, Miyazaki, Seiichi, Hirose, Masataka
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Volume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.L519
Date:
April, 1996
File:
PDF, 647 KB
english, 1996
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