Negative Ion Assisted Silicon Oxidation in Downstream of...

Japanese Journal of Applied Physics 1998 / 9 Vol. 37; Iss. Part 1, No

Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma

Koromogawa, Takashi, Fujii, Takashi, Yamashita, Akihito, Horiike, Yasuhiro, Shindo, Haruo
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Volume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.5028
Date:
September, 1998
File:
PDF, 480 KB
1998
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