Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
Nagai, Hisao, Hori, Masaru, Goto, Toshio, Fujii, Toshiaki, Hiramatsu, MineoVolume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.2775
Date:
May, 2003
File:
PDF, 321 KB
english, 2003