Degradation in Low-Temperature Poly-Si Thin Film...

Japanese Journal of Applied Physics 2005 / 5 Vol. 44; Iss. 5A

Degradation in Low-Temperature Poly-Si Thin Film Transistors Depending on Grain Boundaries

Uraoka, Yukiharu, Kitajima, Koji, Kirimura, Hiroshi, Yano, Hiroshi, Hatayama, Tomoaki, Fuyuki, Takashi
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2895
Date:
May, 2005
File:
PDF, 621 KB
english, 2005
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