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10-nm-Scale Pattern Delineation Using Calixarene Electron Beam Resist for Complementary Metal Oxide Semiconductor Gate Etching
Narihiro, Mitsuru, Arai, Kohichi, Ishida, Masahiko, Ochiai, Yukinori, Natsuka, YasutakaVolume:
44
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.5581
Date:
July, 2005
File:
PDF, 569 KB
2005