Application of Thermal Plasma Jet Irradiation to...

Japanese Journal of Applied Physics 2011 / 3 Vol. 50; Iss. 3

Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication

Higashi, Seiichiro, Hayashi, Shohei, Hiroshige, Yasuo, Nishida, Yusuke, Murakami, Hideki, Miyazaki, Seiichi
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.03CB10
Date:
March, 2011
File:
PDF, 411 KB
english, 2011
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