Multiple-Height Microstructure Fabricated by Deep Reactive...

Japanese Journal of Applied Physics 2012 / 1 Vol. 51; Iss. 1

Multiple-Height Microstructure Fabricated by Deep Reactive Ion Etching and Selective Ashing of Resist Layer Combined with Ultraviolet Curing

Kumagai, Shinya, Hikita, Akiyoshi, Iwamoto, Takuya, Tomikawa, Takashi, Hori, Masaru, Sasaki, Minoru
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Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.01AB04
Date:
January, 2012
File:
PDF, 1.09 MB
english, 2012
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