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Impact of Deposition Temperature of the Silicon Oxide Passivation on the Performance of Indium Zinc Oxide Thin-Film Transistors
Li, Min, Lan, Linfeng, Xu, Miao, Xu, Hua, Luo, Dongxiang, Xiong, Nana, Peng, JunbiaoVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.076501
Date:
June, 2012
File:
PDF, 525 KB
english, 2012