Pattern transfer into silicon using sub-10 nm masks made by...

Journal of Micro/Nanolithography MEMS and MOEMS 2015 / 07 Vol. 14; Iss. 3

Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

Scotuzzi, Marijke, Kamerbeek, Martin J., Goodyear, Andy, Cooke, Mike, Hagen, Cornelis W.
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Volume:
14
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.14.3.031206
Date:
July, 2015
File:
PDF, 2.72 MB
english, 2015
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