In Situ Deoxidation of GaAs Substrates by HCl...

Japanese Journal of Applied Physics 1987 / 1 Vol. 26; Iss. Part 2, No

In Situ Deoxidation of GaAs Substrates by HCl Gas

Massies, Jean, Contour, Jean-Pierre
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Volume:
26
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.26.l38
Date:
January, 1987
File:
PDF, 198 KB
english, 1987
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