Layer-By-Layer Controlled Digital Etching by Means of an Electron-Beam-Excited Plasma System
Meguro, Takashi, Ishii, Masashi, Kodama, Hirokazu, Hamagaki, Manabu, Hara, Tamio, Yamamoto, Yasuhiro, Aoyagi, YoshinobuVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.29.2216
Date:
October, 1990
File:
PDF, 781 KB
1990