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Effects of Oxygen Concentration and Annealing Sequence on Microstructure of Separation by Implanted Oxygen Wafer with High-Temperature Annealing
Kawazu, Satoru, Miyatake, Hiroshi, Yamaguchi, Yasuo, Nishimura, Tadashi, Koyama, HiroshiVolume:
30
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.30.112
Date:
January, 1991
File:
PDF, 1.86 MB
1991