Chemical Vapor Deposition of Cu Film on SiO...

Japanese Journal of Applied Physics 1992 / 12 Vol. 31; Iss. Part 2, No

Chemical Vapor Deposition of Cu Film on SiO 2 Using Cyclopentadienylcoppertriethylphosphine

Chichibu, Shigefusa, Yoshida, Nobuhide, Higuchi, Hirofumi, Matsumoto, Satoru
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Volume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.31.l1778
Date:
December, 1992
File:
PDF, 708 KB
1992
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