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TiN Thin Film Prepared by Chemical Vapor Deposition Method Using Cp 2 Ti(N 3 ) 2
Ikeda, Koichi, Maeda, Masahiko, Arita, YoshinobuVolume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.3085
Date:
June, 1993
File:
PDF, 708 KB
1993