TiN Thin Film Prepared by Chemical Vapor Deposition Method...

TiN Thin Film Prepared by Chemical Vapor Deposition Method Using Cp 2 Ti(N 3 ) 2

Ikeda, Koichi, Maeda, Masahiko, Arita, Yoshinobu
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Volume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.3085
Date:
June, 1993
File:
PDF, 708 KB
1993
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