Si LSI Process Technology for Integrating Ferroelectric...

Japanese Journal of Applied Physics 1994 / 9 Vol. 33; Iss. Part 1, No

Si LSI Process Technology for Integrating Ferroelectric Capacitors

Arita, Koji, Fujii, Eiji, Shimada, Yasuhiro, Uemoto, Yasuhiro, Nasu, Toru, Inoue, Atsuo, Matsuda, Akihiro, Otsuki, Tatsuo, Suzuoka, Nobuyuki
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.33.5397
Date:
September, 1994
File:
PDF, 584 KB
english, 1994
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