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Application of a New Adhesion Promoter to Stable Chemically Amplified Resist Pattern Fabrication on Boron Phosphorus Silicate Glass Substrates
Endo, Masayuki, Katsuyama, AkikoVolume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.36.7617
Date:
December, 1997
File:
PDF, 617 KB
1997