Stability and Application to Multilevel Metallization of...

Japanese Journal of Applied Physics 2000 / 3 Vol. 39; Iss. Part 1, No

Stability and Application to Multilevel Metallization of Fluorine-Doped Silicon Oxide by High-Density Plasma Chemical Vapor Deposition

Koyanagi, Ken-ichi, Kishimoto, Koji, Huo, Tai-Chan, Matsumoto, Akira, Okada, Norio, Sumihiro, Naotaka, Gomi, Hideki
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.39.1091
Date:
March, 2000
File:
PDF, 287 KB
english, 2000
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