Automatic Dose Optimization System for Resist...

Japanese Journal of Applied Physics 2000 / 12 Vol. 39; Iss. Part 1, No

Automatic Dose Optimization System for Resist Cross-Sectional Profile in a Electron Beam Lithography

Hirai, Yoshihiko, Kikuta, Hisao, Okano, Masato, Yotsuya, Tsutomu, Yamamoto, Kazuya
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.39.6831
Date:
December, 2000
File:
PDF, 971 KB
english, 2000
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