Effects of Post CF 4 Plasma...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Effects of Post CF 4 Plasma Treatment on the HfO 2 Thin Film

Lai, Chao Sung, Wu, Woei Cherng, Fan, Kung Ming, Wang, Jer Chyi, Lin, Shian Jyh
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.2307
Date:
April, 2005
File:
PDF, 219 KB
english, 2005
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