Effects of Postetching Treatment on...

Japanese Journal of Applied Physics 2011 / 5 Vol. 50; Iss. 5

Effects of Postetching Treatment on Molecular-Pore-Stacking/Cu Interconnects for 28 nm Node and Beyond

Oshida, Daisuke, Kume, Ippei, Katsuyama, Hirokazu, Taiji, Toshiji, Maruyama, Takuya, Ueki, Makoto, Inoue, Naoya, Iguchi, Manabu, Fujii, Kunihiro, Oda, Noriaki, Sakurai, Michio
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.50.05eb04
Date:
May, 2011
File:
PDF, 248 KB
english, 2011
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