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Atomic Diffusion in Cu/Si (111) and Cu/SiO 2 /Si (111) Systems by Neutral Cluster Beam Deposition
Bo, Cao, Gong-Ping, Li, Xi-Meng, Chen, Seong-Jin, Cho, Hee, KimVolume:
25
Language:
english
Journal:
Chinese Physics Letters
DOI:
10.1088/0256-307X/25/4/064
Date:
April, 2008
File:
PDF, 152 KB
english, 2008