SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Recent advances in 193-nm single-layer photoresists based on alternating copolymers of cycloolefins
Houlihan, Francis M., Wallow, Thomas I., Timko, Allen G., Neria, E., Hutton, Richard S., Cirelli, Raymond A., Nalamasu, Omkaram, Reichmanis, Elsa, Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275856
File:
PDF, 473 KB
english, 1997