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Characteristics of Ion Beam Assisted Etching of GaAs Using Focused Ion Beam: Dependence on Gas Pressure
Ochiai, Yukinori, Gamo, Kenji, Namba, SusumuVolume:
23
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L400
Date:
June, 1984
File:
PDF, 654 KB
1984