Fabrication of Chalcogenide Amorphous Semiconductor Diodes...

Japanese Journal of Applied Physics 1987 / 7 Vol. 26; Iss. Part 1, No

Fabrication of Chalcogenide Amorphous Semiconductor Diodes Using Low Temperature Thermal Diffusion Techniques

Okano, Shuichi, Yamakawa, Hiroshi, Suzuki, Masakuni, Hiraki, Akio
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Volume:
26
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.26.1102
Date:
July, 1987
File:
PDF, 198 KB
english, 1987
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