Application of Photobleachable Positive Resist and Contrast Enhancement Material to KrF Excimer Laser Lithography
Endo, Masayuki, Tani, Yoshiyuki, Sasago, Masaru, Nomura, Noburu, Das, SiddharthaVolume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.2357
Date:
November, 1989
File:
PDF, 242 KB
english, 1989