Low Temperature Silicon Surface Cleaning by HF...

Japanese Journal of Applied Physics 1989 / 12 Vol. 28; Iss. Part 1, No

Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (II)– in situ UVOC

Kaneko, Tetsuya, Suemitsu, Maki, Miyamoto, Nobuo
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Volume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.2425
Date:
December, 1989
File:
PDF, 248 KB
english, 1989
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