Photoresist Ashing Process Using Carbon Tetrafluoride Gas...

Japanese Journal of Applied Physics 2001 / 7 Vol. 40; Iss. Part 1, No

Photoresist Ashing Process Using Carbon Tetrafluoride Gas Plasma with Ammonia Gas Addition

Saito, Makoto, Eto, Hideo, Omiya, Kayoko, Homma, Tetsuya, Nagatomo, Takao
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.4475
Date:
July, 2001
File:
PDF, 191 KB
english, 2001
Conversion to is in progress
Conversion to is failed