Application of Plasma Jet Crystallization Technique to...

Japanese Journal of Applied Physics 2005 / 01 Vol. 44; Iss. 3

Application of Plasma Jet Crystallization Technique to Fabrication of Thin-Film Transistor

Higashi, Seiichiro, Kaku, Hirotaka, Murakami, Hideki, Miyazaki, Seiichi, Watakabe, Hajime, Ando, Nobuyuki, Sameshima, Toshiyuki
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.L108
Date:
January, 2005
File:
PDF, 875 KB
english, 2005
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