Evaluation of Strain in Si-on-Insulator Substrate Induced...

Japanese Journal of Applied Physics 2008 / 3 Vol. 47; Iss. 3

Evaluation of Strain in Si-on-Insulator Substrate Induced by Si 3 N 4 Capping Film

Ogura, Atsushi, Kosemura, Daisuke, Kakemura, Yasuto, Yoshida, Tetsuya, Uchida, Hidetsugu, Hattori, Nobuyoshi, Yoshimaru, Masaki
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Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.1465
Date:
March, 2008
File:
PDF, 158 KB
english, 2008
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