A Comparative Study of Nitrogen Gas Flow Ratio Dependence...

Japanese Journal of Applied Physics 2009 / 5 Vol. 48; Iss. 5

A Comparative Study of Nitrogen Gas Flow Ratio Dependence on the Electrical Characteristics of Sputtered Titanium Nitride Gate Bulk Planar Metal–Oxide–Semiconductor Field-Effect Transistors and Fin-Type Metal–Oxide–Semiconductor Field-Effect Transistors

Hayashida, Tetsuro, Liu, Yongxun, Matsukawa, Takashi, Endo, Kazuhiko, O'uchi, Shinich, Sakamoto, Kunihiro, Ishii, Kenichi, Tsukada, Junichi, Ishikawa, Yuki, Yamauchi, Hiromi, Suzuki, Eiichi, Ogura, At
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.05DC01
Date:
May, 2009
File:
PDF, 313 KB
english, 2009
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