Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2013 Vol. 31; Iss. 6
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Dot-matrix marks for dynamic overlay measurements in electron beam lithography
Kratschmer, Ernst, Bucchignano, James J., Klaus, David P., Guillorn, Michael A.Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4826696
File:
PDF, 1.75 MB
english, 2013