Quantitative Analysis of Etching Rate Profiles for 11 B + -Implanted Si 3 N 4 Film
Nakata, Jyoji, Kajiyama, KenjiVolume:
22
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.188
Date:
January, 1983
File:
PDF, 180 KB
english, 1983